Field-Induced Nanolithography for High-Throughput Pattern...

Field-Induced Nanolithography for High-Throughput Pattern Transfer

Tommi K. Hakala, Veikko Linko, Antti-Pekka Eskelinen, J. Jussi Toppari, Anton Kuzyk, Päivi Törmä
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Volume:
5
Year:
2009
Language:
english
Pages:
4
DOI:
10.1002/smll.200901326
File:
PDF, 201 KB
english, 2009
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