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ChemInform Abstract: Anisotropic Reactive Ion Etching of Aluminum Using Cl2, BCl3, and CH4 Gases.
LUTZE, J. W., PERERA, A. H., KRUSIUS, J. P.Volume:
21
Journal:
ChemInform
DOI:
10.1002/chin.199014346
Date:
April, 1990
File:
PDF, 184 KB
1990