Etch Properties of Hf-Based High- k Dielectrics Using Inductively Coupled Plasma
Kim, Gwan-Ha, Kim, Kyoung-Tae, Woo, Jong-Chang, Kim, Chang-IlVolume:
357
Language:
english
Journal:
Ferroelectrics
DOI:
10.1080/00150190701527605
Date:
September, 2007
File:
PDF, 732 KB
english, 2007