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Chemical Vapor Deposition of Ru Bottom Electrode for Ferroelectric Bi 4 − x La x Ti 3 O 12 Capacitors
Furukawa, Taisuke, Kuroiwa, Takeharu, Fujisaki, Yoshihisa, Sato, Takehiko, Ishiwara, HiroshiVolume:
59
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/714040805
Date:
September, 2003
File:
PDF, 367 KB
english, 2003