[IEEE 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2016.5.16-2016.5.19)] 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Surface contamination control through Atomically Clean Surface (ACS™) processing for semiconductor equipment parts for sub-20 nanometer nodes (Topics: CFM, DI, ER, YE)
Sidhwa, Ardeshir Ardy J., Khalil, Osama, Deem, John, Zuck, David, House, MatthewYear:
2016
Language:
english
DOI:
10.1109/asmc.2016.7491137
File:
PDF, 665 KB
english, 2016