[IEEE 2005 IEEE International Conference on Mechatronics and Automation - Niagara Falls, Ont., Canada (29 July-1 Aug. 2005)] IEEE International Conference Mechatronics and Automation, 2005 - Development of 3-axis nano stage for precision positioning in lithography system
Dong-Ju Lee,, Kang-Nyung Lee,, No-Cheol Park,, Young-Pil Park,, Hyuk Kim,, Suk-Won Lee,, Hyoung Gil Choi,, Moon Gu Lee,, Jiho Uh,, Jung-Woo Park,, Yong-Hwan Choi,, Dong-Jin Lee,Volume:
3
Year:
2005
Language:
english
DOI:
10.1109/icma.2005.1626794
File:
PDF, 791 KB
english, 2005