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Local Electro-Thermal Annealing for Repair of Total...

IEEE Electron Device Letters 2016 / 7 Vol. 37; Iss. 7

Local Electro-Thermal Annealing for Repair of Total Ionizing Dose-Induced Damage in Gate-All-Around MOSFETs

Park, Jun-Young, Moon, Dong-Il, Bae, Hagyoul, Roh, Young Tak, Seol, Myeong-Lok, Lee, Byung-Hyun, Jeon, Chang-Hoon, Lee, Hee Chul, Choi, Yang-Kyu
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Volume:
37
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/led.2016.2574341
Date:
July, 2016
File:
PDF, 398 KB
english, 2016
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