[IEEE 2014 Silicon Nanoelectronics Workshop (SNW) - Honolulu, HI, USA (2014.6.8-2014.6.9)] 2014 Silicon Nanoelectronics Workshop (SNW) - 50 nm AlxOy ReRAM array retention characteristics before and after endurance
Yamazawa, Hiroki, Ning, Sheyang, Iwasaki, Tomoko Ogura, Tanakamaru, Shuhei, Johguchi, Koh, Takeuchi, KenYear:
2014
Language:
english
DOI:
10.1109/snw.2014.7348598
File:
PDF, 378 KB
english, 2014