SPIE Proceedings [SPIE Microelectronic Processing '92 - San Jose, CA (Sunday 20 September 1992)] Advanced Techniques for Integrated Circuit Processing II - New dry-development process of trilayer resist systems for advanced lithography
Joubert, Olivier P., Martinet, C., Pelletier, Jacques H., Pons, Michel J., Francou, Jean-Marc, Panabiere, Jean-Pierre, Weill, Andre P., Tedesco, Serge V., Vinet, Francoise, Mourier, Thierry, Bondur, JVolume:
1803
Year:
1993
Language:
english
DOI:
10.1117/12.142920
File:
PDF, 903 KB
english, 1993