SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III - Development of a polycapillary collimator for point-source x-ray lithography
Vartanian, Michael H., Gibson, David M., Frankel, Robert D., Drumheller, Jerry P., Patterson, David O.Volume:
1924
Year:
1993
Language:
english
DOI:
10.1117/12.146531
File:
PDF, 743 KB
english, 1993