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SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Relationship between resist performance and diffusion in chemically amplified resist systems
Fedynyshyn, Theodore H., Szmanda, Charles R., Blacksmith, Robert F., Houck, William E., Hinsberg, William D.Volume:
1925
Year:
1993
Language:
english
DOI:
10.1117/12.154742
File:
PDF, 579 KB
english, 1993