![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Delay-time effects between exposure and post-exposure bake in acetal-based deep-UV photoresists
Roeschert, Horst, Eckes, Charlotte, Endo, Hajime, Kinoshita, Yoshiaki, Kudo, Takanori, Masuda, Seiya, Okazaki, Hiroshi, Padmanaban, Munirathna, Przybilla, Klaus J., Spiess, Walter, Suehiro, Natusmi, WVolume:
1925
Year:
1993
Language:
english
DOI:
10.1117/12.154753
File:
PDF, 1.47 MB
english, 1993