![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Buckling characterization of gate all around silicon nanowires
Levi, Shimon, Schwarzband, Ishai, Weinberg, Yakov, Cornell, Roger, Adan, Ofer, Cohen, Guy M., Cen, Cheng, Gignac, Lynne, Starikov, Alexander, Cain, Jason P.Volume:
8681
Year:
2013
Language:
english
DOI:
10.1117/12.2013810
File:
PDF, 1.21 MB
english, 2013