SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX - Advanced chemically amplified resist
Takahashi, Hideki, Wakui, Kenichi, Herr, Daniel J., Petersen, John S., Fedynyshyn, Theodore H., Cronin, Michael F., Resnick, Douglas J.Volume:
1263
Year:
1990
Language:
english
DOI:
10.1117/12.20166
File:
PDF, 685 KB
english, 1990