SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Optical/Laser Microlithography VIII - Simulation study of a new phase-shifting mask: halftone-rim
Loong, Wen-An, Yeh, Chin-hwa, Shy, Shyi-Long, Brunner, Timothy A.Volume:
2440
Year:
1995
Language:
english
DOI:
10.1117/12.209275
File:
PDF, 368 KB
english, 1995