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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Design-Process-Technology Co-optimization for Manufacturability X - Integrated layout based Monte-Carlo simulation for design arc optimization
Capodieci, Luigi, Cain, Jason P., Shao, Dongbing, Clevenger, Larry, Zhuang, Lei, Liebmann, Lars, Wong, Robert, Culp, JamesVolume:
9781
Year:
2016
Language:
english
DOI:
10.1117/12.2218636
File:
PDF, 339 KB
english, 2016