SPIE Proceedings [SPIE Photomask Japan '97 - Kawasaki City, Japan (Thursday 17 April 1997)] Photomask and X-Ray Mask Technology IV - Chemically enhanced focused-ion-beam (FIB) repair of opaque defects on chrome photomasks
Casey, Jr., J. David, Doyle, Andrew F., Stewart, Diane K., Ferranti, David C., Aizaki, NaoakiVolume:
3096
Year:
1997
Language:
english
DOI:
10.1117/12.277264
File:
PDF, 479 KB
english, 1997