SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] Microelectronic Manufacturing Yield, Reliability, and Failure Analysis IV - Photolithography expert system for improved estimation of IC critical area
Chia, Mark P., Allan, Gerard A., Walton, Anthony J., Prasad, Sharad, Hartmann, Hans-Dieter, Tsujide, TohruVolume:
3510
Year:
1998
Language:
english
DOI:
10.1117/12.324394
File:
PDF, 932 KB
english, 1998