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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Antireflective coating strategies for 193-nm lithography
Stephen, Alan, Dean, Kim R., Byers, Jeff D., Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350184
File:
PDF, 3.80 MB
english, 1999