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SPIE Proceedings [SPIE Photomask and X-Ray Mask Technology VI - Yokohama, Japan (Tuesday 13 April 1999)] Photomask and X-Ray Mask Technology VI - Impact of mask CD error on wafer CD error at low-k1 photolithography
Kim, Byung G., Choi, Seong-Woon, Choi, Ji-Hyun, Chun, Chan-Uk, Yoon, Hee-Sun, Sohn, Jung-Min, Morimoto, HiroakiVolume:
3748
Year:
1999
Language:
english
DOI:
10.1117/12.360250
File:
PDF, 431 KB
english, 1999