![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Tuning MEEF for CD control at 65nm node based on Chromeless Phase Lithography (CPL)
Van Den Broeke, Douglas J., Laidig, Thomas L., Wampler, Kurt E., Hsu, Stephen, Shi, Xuelong, Hsu, Michael, Burchard, Paul, Chen, J. Fung, Grenon, Brian J., Kimmel, Kurt R.Volume:
4889
Year:
2002
Language:
english
DOI:
10.1117/12.467508
File:
PDF, 465 KB
english, 2002