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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - New approach for pattern collapse problem by increasing contact area at sub-100nm patterning
Lee, Sung-Koo, Jung, Jae Chang, Lee, Min Suk, Lee, Sung K., Kim, Sam Young, Hwang, Young-Sun, Bok, Cheol K., Moon, Seung-Chan, Shin, Ki S., Kim, Sang-Jung, Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485052
File:
PDF, 1.07 MB
english, 2003