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SPIE Proceedings [SPIE Advanced Microelectronic Manufacturing - Santa Clara, CA (Sunday 23 February 2003)] Process and Materials Characterization and Diagnostics in IC Manufacturing - Development of an electron optical system using EB projection optics in reflection mode for EB inspection
Yamazaki, Yuichiro, Nagahama, Ichirota, Onishi, Atsushi, Tobin, Jr., Kenneth W., Emami, IrajVolume:
5041
Year:
2003
Language:
english
DOI:
10.1117/12.485231
File:
PDF, 546 KB
english, 2003