SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Low-stress stencil masks using SOI substrates for EPL and LEEPL
Eguchi, Hideyuki, Tanabe, Hiroyoshi, Kurosu, Toshiaki, Yoshii, Takashi, Sugimura, Hiroshi, Itoh, Kojiro, Tamura, AkiraVolume:
5130
Year:
2003
DOI:
10.1117/12.504234
File:
PDF, 724 KB
2003