SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - Fabrication of programmed phase defects on EUV multilayer blanks
Kinoshita, Takeru, Kimmel, Kurt R., Staud, Wolfgang, Shoki, Tsutomu, Kobayashi, Hideo, Ohkubo, Ryo, Usui, You-Ichi, Hosoya, Morio, Sakaya, Noriyuki, Nagarekawa, OsamuVolume:
5256
Year:
2003
Language:
english
DOI:
10.1117/12.517836
File:
PDF, 520 KB
english, 2003