SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Simultaneous critical dimension and overlay measurements on a SEM through target design for inline manufacturing lithography control
Solecky, Eric P., Silver, Richard M., Morillo, Jaime D.Volume:
5375
Year:
2004
Language:
english
DOI:
10.1117/12.533756
File:
PDF, 117 KB
english, 2004