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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Design and development of novel monomers and copolymers for 193-nm lithography
Otake, Atsushi, Sturtevant, John L., Araya, Emi, Momose, Hikaru, Ansai, Ryuichi, Tooyama, Masayuki, Fujiwara, TadayukiVolume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.534628
File:
PDF, 89 KB
english, 2004