![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Edge die focus-exposure monitoring and compensation to improve CD distributions
Eichelberger, Brad J., Silver, Richard M., Subramony, Venkatram, Chew, Augustine, Dinu, Berta A., Goh, Dawn, Lim, Pei Chin, Monahan, Kevin M.Volume:
5375
Year:
2004
Language:
english
DOI:
10.1117/12.535196
File:
PDF, 571 KB
english, 2004