SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Emerging Lithographic Technologies IX - Evaluation of tin-foil targets for debris mitigation in laser generated EUV source
Yamaura, Michiteru, Mackay, R. Scott, Uchida, Shigeaki, Takemoto, Susumu, Shimada, Yoshinori, Nishimura, Hiroaki, Fujioka, Shinsuke, Nagai, Keiji, Norimatsu, Takayoshi, Nishihara, Katsunobu, Miyanaga,Volume:
5751
Year:
2005
Language:
english
DOI:
10.1117/12.599155
File:
PDF, 342 KB
english, 2005