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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Pattern defect study using cover material film in immersion lithography
Kawamura, Daisuke, Lin, Qinghuang, Takeishi, Tomoyuki, Matsunaga, Kentarou, Shiobara, Eishi, Oonishi, Yasunobu, Ito, ShinichiVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.655505
File:
PDF, 725 KB
english, 2006