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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Copolymer fraction effect on acid catalyzed deprotection reaction kinetics in model 193 nm photoresists
Kang, Shuhui, Lin, Qinghuang, Prabhu, Vivek M., Vogt, Bryan D., Lin, Eric K., Wu, Wen-Li, Turnquest, KarenVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.656594
File:
PDF, 276 KB
english, 2006