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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
Naulleau, Patrick P., Lercel, Michael J., Rammeloo, Clemens, Cain, Jason P., Dean, Kim, Denham, Paul, Goldberg, Kenneth A., Hoef, Brian, La Fontaine, Bruno, Pawloski, Adam R., Larson, Carl, Wallraff,Volume:
6151
Year:
2006
Language:
english
DOI:
10.1117/12.657005
File:
PDF, 462 KB
english, 2006