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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Design and Process Integration for Microelectronic Manufacturing IV - CD analysis of advanced photolithography and its impact on critical design structures
Romero, Karla A., Wong, Alfred K. K., Singh, Vivek K., Seltmann, Rolf, Burbach, Gert, Stephan, Rolf, Paufler, Joerg, Greenlaw, DavidVolume:
6156
Year:
2006
Language:
english
DOI:
10.1117/12.657131
File:
PDF, 497 KB
english, 2006