SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - In-line semi-electrical process diagnosis methodology for integrated process window optimization of 65nm and below technology nodes
Lei, Ming-Ta, Archie, Chas N., Tang, Kok-Hiang, Wang, Yung-Chih, Huang, Chia-Hsing, Jeng, Chih-Cherng, Wang, Lu-Kai, Fang, Wei, Zhao, Yan, Jau, Jack, Hsia, Chin C., Liang, M. S.Volume:
6152
Year:
2006
Language:
english
DOI:
10.1117/12.657803
File:
PDF, 417 KB
english, 2006