SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Mask substrate birefringence requirements for hyper-NA lithography
van de Kerkhof, Mark, Flagello, Donis G., de Boeij, Wim, Demarteau, Marcel, Geh, Bernd, Leunissen, Leonardus H. A., Martin, Patrick, Cangemi, MikeVolume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.659057
File:
PDF, 521 KB
english, 2006