SPIE Proceedings [SPIE SPIE 31st International Symposium on...

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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Mask substrate birefringence requirements for hyper-NA lithography

van de Kerkhof, Mark, Flagello, Donis G., de Boeij, Wim, Demarteau, Marcel, Geh, Bernd, Leunissen, Leonardus H. A., Martin, Patrick, Cangemi, Mike
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Volume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.659057
File:
PDF, 521 KB
english, 2006
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