SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Reduction of MDP time through the improvement of verification method
Noh, Young-Hwa, Hoga, Morihisa, Jang, Sung-Hoon, Ki, Won-Tai, Choi, Ji-Hyeon, Choi, Seong-Woon, Han, Woo-SungVolume:
6283
Year:
2006
Language:
english
DOI:
10.1117/12.681800
File:
PDF, 1.32 MB
english, 2006