SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Evaluating diffraction based overlay metrology for double patterning technologies
Saravanan, Chandra Saru, Allgair, John A., Raymond, Christopher J., Liu, Yongdong, Dasari, Prasad, Kritsun, Oleg, Volkman, Catherine, Acheta, Alden, La Fontaine, BrunoVolume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.774736
File:
PDF, 1.18 MB
english, 2008