SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Integration of high-speed surface-channel charge coupled devices into an SOI CMOS process using strong phase shift lithography
Knecht, Jeffrey, Bolkhovsky, Vladimir, Sage, Jay, Tyrrell, Brian, Wheeler, Bruce, Wynn, CharlesVolume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.777133
File:
PDF, 1004 KB
english, 2008