SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan -...

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SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Cluster optimization to improve CD control as an enabler for double patterning

Tedeschi, Len, Chen, Alek C., Lin, Burn, Rosslee, Craig, Laidler, David, Yen, Anthony, Leray, Philippe, D'havé, Koen
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Volume:
7140
Year:
2008
Language:
english
DOI:
10.1117/12.805239
File:
PDF, 2.95 MB
english, 2008
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