SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Cluster optimization to improve CD control as an enabler for double patterning
Tedeschi, Len, Chen, Alek C., Lin, Burn, Rosslee, Craig, Laidler, David, Yen, Anthony, Leray, Philippe, D'havé, KoenVolume:
7140
Year:
2008
Language:
english
DOI:
10.1117/12.805239
File:
PDF, 2.95 MB
english, 2008