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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Advanced modeling strategies to improve overlay control for 32-nm lithography processes
Minvielle, Anna, Allgair, John A., Raymond, Christopher J., Singh, Lovejeet, Schefske, Jeffrey, Reiss, Joerg, Kent, Eric, Manchester, Terry, Eichelberger, Brad, O'Brien, Kelly, Manka, Jim, Robinson, JVolume:
7272
Year:
2009
Language:
english
DOI:
10.1117/12.814256
File:
PDF, 289 KB
english, 2009