SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - An open-architecture approach to defect analysis software for mask inspection systems
Pereira, Mark, Hosono, Kunihiro, Pai, Ravi R., Reddy, Murali Mohan, Krishna, Ravi M.Volume:
7379
Year:
2009
Language:
english
DOI:
10.1117/12.824321
File:
PDF, 337 KB
english, 2009