SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Mask defect specification in the spacer patterning process by using a fail-bit-map analysis
Miyoshi, Seiro, Chen, Alek C., Han, Woo-Sung, Yamaguchi, Shinji, Naka, Masato, Lin, Burn J., Yen, Anthony, Morishita, Keiko, Hirano, Takashi, Morinaga, Hiroyuki, Mashita, Hiromitsu, Kobiki, Ayumi, KanVolume:
7520
Year:
2009
Language:
english
DOI:
10.1117/12.837132
File:
PDF, 650 KB
english, 2009