SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Three-dimensional physical photoresist model calibration and profile-based pattern verification
Talbi, Mohamed, Dusa, Mircea V., Conley, Will, Abdo, Amr Y., Bailey, Todd C., Conley, Will, Dunn, Derren N., Fujimoto, Masashi, Nickel, John, Chung, No Young, Marokkey, Sajan, Lee, Si Hyeung, Sarma, CVolume:
7640
Year:
2010
Language:
english
DOI:
10.1117/12.846466
File:
PDF, 1.67 MB
english, 2010
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