SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Photon flux requirements for EUV reticle imaging microscopy in the 22- and 16nm nodes
La Fontaine, Bruno M., Wintz, Daniel T., Goldberg, Kenneth A., Mochi, Iacopo, Huh, SungminVolume:
7636
Year:
2010
Language:
english
DOI:
10.1117/12.846528
File:
PDF, 2.00 MB
english, 2010