SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Robust resolution enhancement optimization methods to process variations based on vector imaging model
Ma, Xu, Li, Yanqiu, Guo, Xuejia, Dong, Lisong, Conley, WillVolume:
8326
Year:
2012
Language:
english
DOI:
10.1117/12.916147
File:
PDF, 561 KB
english, 2012