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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Interactions between imaging layers during LPLE double patterning lithography
Robertson, Stewart, Wong, Patrick, De Bisschop, Peter, Vandenbroeck, Nadia, Wiaux, Vincent, Conley, WillVolume:
8326
Year:
2012
Language:
english
DOI:
10.1117/12.918058
File:
PDF, 10.05 MB
english, 2012