SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Roughness metrology of gate all around silicon nanowire devices
Levi, Shimon, Schwarzband, Ishai, Kris, Roman, Adan, Ofer, Cohen, Guy M., Bangsaruntip, Sarunya, Gignac, Lynne, Starikov, AlexanderVolume:
8324
Year:
2012
Language:
english
DOI:
10.1117/12.918402
File:
PDF, 1.80 MB
english, 2012