Atomic Layer Deposited Aluminum Oxide for Interface...

Atomic Layer Deposited Aluminum Oxide for Interface Passivation of Cu 2 ZnSn(S,Se) 4 Thin-Film Solar Cells

Lee, Yun Seog, Gershon, Talia, Todorov, Teodor K., Wang, Wei, Winkler, Mark T., Hopstaken, Marinus, Gunawan, Oki, Kim, Jeehwan
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Volume:
6
Language:
english
Journal:
Advanced Energy Materials
DOI:
10.1002/aenm.201600198
Date:
June, 2016
File:
PDF, 386 KB
english, 2016
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