Photosensitive resist system composed of phenolic resin and aromatic azide
Nonogaki, Saburo, Toriumi, MinoruVolume:
33
Language:
english
Journal:
Makromolekulare Chemie. Macromolecular Symposia
DOI:
10.1002/masy.19900330120
Date:
March, 1990
File:
PDF, 320 KB
english, 1990