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SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III - Exposure and resist-process condition dependence of replicated-pattern accuracy in SR lithography
Morigami, M., Tanaka, T., Watanabe, Takeo, Yamashita, Yoshio, Fujiwara, Shuji, Nishino, Junichi, Harada, M., Yamaoka, Y., Yuasa, R., Inai, M., Suzuki, S., Patterson, David O.Volume:
1924
Year:
1993
DOI:
10.1117/12.146511
File:
PDF, 515 KB
1993